List of Publications
A. Original papres (原著論文)
A-1:
TXRF and related XRF (全反射現象を利用した蛍光Ｘ線分析)
[1] K. Tsuji and K. Hirokawa, Take-off
angle-dependent x-ray fluorescence of thin films at glancing incidence, Spectrochim. Acta. B, 48,
1471-1480 (1993).
[2] K. Tsuji and K. Hirokawa, Takeoff angle-dependent x-ray fluorescence of layered
materials using a glancing incident x-ray beam, J. Appl. Phys., 75, 7189-7194 (1994).
[3] K. Tsuji, S. Sato, and K. Hirokawa,
Characterization of Au thin film by Glancing-Incidence and -Takeoff X-Ray Fluorescence
Spectroscopy, Jpn. J. Appl. Phys.,
33, L1277-L1279 (1994).
[4] K. Tsuji, A. Sasaki, and K. Hirokawa,
Effect of surface roughness on takeoff-angle-dependent x-ray fluorescence of
ultrathin films at glancing incidence, Jpn. J. Appl. Phys., 33,
6316-6319 (1994).
[5] K. Tsuji, S. Sato, and K. Hirokawa,
Surface-sensitive x-ray fluorescence analysis at glancing incident and takeoff
angles, J. Appl.
Phys., 76, 7860-7863 (1994).
[6] 辻 幸一、佐藤 成男、広川 吉之助、斜入射・斜出射-蛍光Ｘ線分析法による表面・薄膜分析、表面科学 , 15, 668-674 (1994).
[7] 辻 幸一、水戸瀬 賢悟、広川 吉之助、斜入射条件下における取り出し角依存-蛍光Ｘ線分析法による真空蒸着薄膜および溶液滴下-乾燥薄膜の分析、Ｘ線分析の進歩 , 26, 59-74
(1995).
[8] K. Tsuji, T. Yamada, T. Utaka, and
K. Hirokawa, The effects of surface roughness on the angle-dependent
total-reflection x-ray fluorescence of ultrathin films, J. Appl. Phys., 78, 969-973 (1995).
[9] K. Tsuji, S. Sato, and K. Hirokawa,
Depth profiling using the glancing-incidence and -takeoff x-ray fluorescence
method, Rev. Sci.
Instrum., 66,
4847-4852 (1995).
[10] S. Sato, K. Tsuji, and K. Hirokawa,
Evaluation of Ni/Mn multilayer samples with
glancing-incidence and -takeoff x-ray fluorescence analysis, Appl. Phys. A, 62, 87-93 (1996).
[11] 辻 幸一、広川 吉之助、斜入射・斜出射−蛍光Ｘ線分析法による表面反応の評価
表面科学、17, 346-351 (1996).
[12] K. Tsuji, S. Sato, and K. Hirokawa,
Glancing-incidence and glancing-takeoff x-ray fluorescence analysis of a Mn ultrathin film on an Au layer, Thin Solid Films, 274,
18-22 (1996).
[13] K. Tsuji and K. Wagatsuma, Solid surface density determination
using the glancing-takeoff x-ray fluorescence method, Jpn. J. Appl. Phys., 35, L1535-L1537 (1996).
[14] K. Tsuji and K. Hirokawa,
Nondestructive depth profiling of oxidized Fe-Cr alloy by the
glancing-incidence and -takeoff x-ray fluorescence method, Appl. Surf. Sci., 103, 451-458 (1996).
[15] K. Tsuji, K. Wagatsuma and K. Hirokawa,
Takeoff angle-dependent x-ray fluorescence analysis of thin films on acrylic
substrate, Journal of Trace and
Microprobe Techniques, 15, 1-11
(1997).
[16] K. Tsuji, K. Wagatsuma and K. Oku, Experimental evaluation
of the Mo Ka x-ray penetration depth for a GaAs wafer in a total
reflection x-ray fluorescence analysis, Anal.
Sci., 13 351-354 (1997).
[17] K. Tsuji, K. Wagatsuma, K. Hirokawa,
T. Yamada, and T. Utaka, Development of the
glancing-incidence and -takeoff x-ray fluorescence analysis, Spectrochim. Acta B, 52, 841-846 (1997).
[18] 辻 幸一、我妻 和明、全反射Ｘ線侵入深さの評価、表面科学、18 424-428 (1997).
[19] K. Tsuji, T. Sato and K. Wagatsuma, X-ray fluorescence
analysis by multiple-glancing x-ray beam excitation, Jpn. J. Appl. Phys., 37 5821-5822 (1998).
[20] K. Tsuji, T. Sato, K. Wagatsuma, M. Claes,
and R. Van Grieken, Preliminary experiment of total reflection x-ray
fluorescence using two glancing x-ray beams excitation, Rev. Sci. Instrum.,
70 1621-1623 (1999).
[21] K. Tsuji, H. Takenaka, K.
Wagatsuma, P. K. de Bokx and R. E. Van Grieken,
Enhancement of X-ray fluorescence intensity from ultra-thin Ni layer sandwiched
with carbon layers at grazing-emission angles, Spectrochim. Acta B, 54, 1881-1888 (1999).
[22] K. Tsuji, K. Wagatsuma and T. Oku, Glancing-Incidence and
Glancing-Takeoff X-Ray Fluorescence Analysis of Ni-GaAs Interface-Reactions, X-Ray Spectrometry, 29, 155-160 (2000).
[23] J. Injuk, J. Osán, R. Van Grieken, K.
Tsuji, Airborne particles in the Miyagi Museum of Art in Sendai, Japan,
Studied by Electron Probe X-Ray Microanalysis and Energy Dispersive X-Ray
Fluorescence Analysis, Anal. Sci. 18,
561-566 (2002).
[24] K. Tsuji, K. Wagatsuma, Enhancement of TXRF Intensity by
Using a Reflector, X-Ray Spectrom. 31,
358-362 (2002).
[25] K. Tsuji, F. Delalieux,
Characterization of X-rays emerging from between reflector
and sample
carrier in reflector-assisted TXRF analysis, submitted to X-Ray Spectrom.
A-2:
X-Ray STM (Ｘ線照射−STMに関する研究)
[1] K. Tsuji and K. Hirokawa, X-ray
excited current detected with scanning tunneling microscope equipment, Jpn. J. Appl. Phys.,
34, L1506-L1508 (1995).
[2] K. Tsuji and K. Hirokawa,
Glancing-incidence and takeoff x-ray fluorescence and scanning tunneling
microscopy of thin films under x-ray irradiation, Surf. Interface Anal., 24,
286-289 (1996).
[3] 辻 幸一、広川 吉之助、ＳＴＭ装置を用いたＸ線励起電流の測定、表面科学、17, 161-166 (1996).
[4] K. Tsuji and K. Hirokawa, Characteristics of an x-ray-excited
current detected with an STM tip, Rev. Sci. Instrum., 67, 3573-3577 (1996).
[5] 辻 幸一、我妻 和明、Ｘ線照射下でのＳＴＭ観察と探針電流の測定、Ｘ線分析の進歩、 28, 289-300 (1997).
[6] K. Tsuji and K. Wagatsuma, Optimum gaseous pressure for the
measurement of the x-ray excited scanning tunneling microscope tip current, Jpn. J. Appl. Phys.,
36, 1264-1267 (1997).
[7] K. Tsuji, K. Wagatsuma and K. Hirokawa,
Characteristics of total reflection x-ray excited current detected with the tip
of scanning tunneling microscope, Spectrochim. Acta B, 52,
855-860 (1997).
[8] K. Tsuji, T. Nagamura, and K.
Wagatsuma, Scanning tunneling microscope tip current excited by modulated
x-rays, Jpn. J. Appl. Phys.,
37, 2028-2032 (1998).
[9] K. Tsuji, Y. Hasegawa, K. Wagatsuma and T. Sakurai,
Detection of x-ray induced current using a scanning tunneling microscope and
its spatial mapping for elemental analysis, Jpn. J. Appl. Phys., 37, L1271-L1273 (1998).
[10] K. Tsuji, K. Wagatsuma, K. Sugiyama, K. Hiraga,
Y. Waseda, EXAFS- and XANES-like spectra obtained by
x-ray excited scanning tunneling microscope tip current measurement, Surf. Interface Anal., 27, 132-135 (1999).
[11] Y. Hasegawa, K. Tsuji, K. Nakayama, K. Wagatsuma, T.
Sakurai, X-ray source combined ultrahigh-vacuum scanning tunneling microscopy
for elemental analysis, J. Vac. Sci. Tech. B.,18, 2676-2680 (2000).
[1]
K. Tsuji, K.Wagatsuma,
R. Nullens, and R. Van Grieken, Grazing-exit electron
probe microanalysis for surface and particle analysis, Anal. Chem., 71,
2497-2501 (1999).
[2]
K. Tsuji, Z. Spolnik, K. Wagatsuma,
J. Zhang, and R. Van Grieken, Enhancement of electron-induced X-ray intensity
for single particles under grazing-exit conditions, Spectrochim. Acta B. 54, 1243-1251 (1999).
[3]
K. Tsuji, Z. Spolnik, K. Wagatsuma,
R. E. Van Grieken, R. D. Vis, Grazing-exit
particle-induced X-ray emission analysis with extremely low background, Anal. Chem. 71, 5033-5036 (1999).
[4]
K. Tsuji, K. Wagatsuma, R. Nullens, and R. Van Grieken, Elemental X-ray images
obtained by grazing-exit electron probe microanalysis (GE-EPMA), J. Anal. At. Spectrom.,
14, 1711-1713 (1999).
[5]
K. Tsuji, M. Huisman,
Z. Spolnik, K. Wagatsuma, Y. Mori, R. E. Van Grieken, R. D. Vis,
Comparison of grazing-exit particle-induced X-ray emission with other related
methods, Spectrochim. Acta
B, 55, 1009-1016 (2000).
[6] K. Tsuji, Y. Murakami, K.
Wagatsuma, G. Love, Surface Studies by
Grazing-Exit Electron Probe Microanalysis (GE-EPMA), X-Ray Spectrometry,
30, 123-126 (2001).
[7] K. Tsuji, Z. Spolnik, K.
Wagatsuma, S. Nagata, I. Satoh, Grazing-Exit X-Ray Spectrometry for Surface and
Thin-Film Analyses, Anal. Sci. 17,
145-148 (2001).
[8] K. Tsuji, Z. Spolnik, and
T. Ashino, New experimental equipment for
grazing-exit electron probe microanalysis (GE-EPMA), Rev. Sci. Instrum., 72,
3933-3936 (2001).
[9] K. Tsuji, Z. Spolnik, K.
Wagatsuma, Continuous x-ray background in grazing-exit electron probe x-ray
microanalysis, Spectrochim. Acta B, 56,
2497-2504 (2001).
[10]
Z. Spolnik, K. Tsuji, K. Saito, K. Asami, K.
Wagatsuma, Quantitative analysis of metallic ultra-thin films by grazing-exit
electron probe x-ray microanalysis, X-Ray Spectrometry, 31, 178-183 (2002).
[11]
Z. Spolnik, J. Zhang, K. Wagastuma,
K. Tsuji, Grazing-exit electron probe x-ray microanalysis of ultra-thin
films and single particles, Anal. Chim. Acta. 455,
245-252 (2002).
[12]
K. Tsuji, K. Saito, K. Asami, K.
Wagatsuma, F. Delalieux, Z. Spolnik, Localized Thin-Film Analysis by
Grazing-Exit EPMA (GE-EPMA), Spectrochim. Acta. B 57,
897-906 (2002).
[13]
Z. Spolnik, K. Tsuji, R. Van Grieken, Grazing-exit electron probe x-ray micro
analysis of light elements, submitted to X-Ray
Spectrom.
[14]
K.
Tsuji, F. Delalieux, K.
Wagatsuma, S. Sato, Calculation of
electron-induced x-ray intensities under grazing-exit conditions, submitted to X-Ray Spectrom.
A-4:
Glow Discharge Plasmas (グロー放電プラズマの機器分析における応用)
[1] K. Tsuji and K. Hirokawa, Depth
profiling studies of oxidized alloy surfaces by glow discharge emission
spectroscopy, Surf. Interface. Anal.,
15, 223-228 (1990).
[2] K. Tsuji and K. Hirokawa,
Conversion of sputtering time into depth in depth profiles of oxidized Cu-Ni
alloys obtained by glow discharge spectroscopy, Surf. Interface. Anal., 17,
819-822 (1991).
[3] K. Tsuji and K. Hirokawa, Studies
on chemical sputtering of Si and C in Ar-H2 glow discharge plasma by
optical emission spectroscopy, Thin Solid
Films, 205, 6-12 (1991).
[4] 辻 幸一、広川 吉之助,グロー放電成膜現象の発光スペクトルによる評価、
日本化学会誌 , 1991, 1379-1385 (1991).
[5] K. Tsuji and K. Hirokawa, Studies
on carbon deposition in Ar-CH4 plasmas with optical emission
spectroscopy and x-ray photoelectron spectroscopy, Appl. Surf. Sci., 59, 31-37 (1992).
[6] K. Tsuji and K. Hirokawa,
Estimation of chemical sputtering rates of carbon in He-H2 glow
discharge plasmas by optical emission spectroscopy, Jpn. J. Appl. Phys., 32, 916-920 (1993).
[7] K. Tsuji, H. Matsuta and K.
Wagatsuma, Fast electrons from Grimm glow discharge helium plasmas,
Jpn. J. Appl. Phys., 36, L446-L448 (1997).
[8] K. Tsuji, K. Wagatsuma and H. Matsuta,
Characteristics of fast electrons from Grimm glow discharge He plasmas as an
electron source, Spectrochim. Acta B, 52 1587-1595
(1997).
[9] 辻 幸一, 我妻 和明, 松田 秀幸,グリム型グロー放電プラズマからの高速電子放出現象とX線元素分析への応用, 分析化学, 46, 863-867 (1997).
[10] 辻 幸一, 松田 秀幸, 我妻 和明,高電圧グロー放電からのX線放射, X線分析の進歩, 29, 223-232 (1998).
[12] K. Tsuji, K. Wagatsuma, S. Yamaguchi, S. Nagata, and K. Hirokawa, X-ray measurement from the cathode surface of
glow discharge tube used as a compact x-ray fluorescence instrument, Spectrochim. Acta B, 53, 1669-1677 (1998).
[13] K. Tsuji and K. Wagatsuma, Compact glow discharge x-ray
tube, Rev. Sci. Instrum.,
69, 4006-4007 (1998).
A-5: Micor-XRF
(マイクロX線分析)
[1] K. Tsuji
and F. Delalieux, Micro x-ray fluorescence using a pinhole aperture in
quasi-contact mode, J. Anal. At. Spectrom. 17, 1405-1407 (2002).
[2] K. Tsuji
and F. Delalieux, Feasibility study of 3 dimensional XRF spectrometry using m-x-ray beam under grazing-exit conditions,
submitted to Spectrochim. Acta B.
B.
Others (解説や総説など)
[1] 辻 幸一、蛍光Ｘ線分析法による薄膜材料の新しい分析・評価法, 日本金属学会会報、32, 180 (1993).
[2] 辻 幸一、広川 吉之助、「全反射現象を利用した蛍光Ｘ線表面分析法」, まてりあ (先端実験技術シリーズ)、35, 1333-1338 (1996).
[3] 辻 幸一、「走査型プローブ顕微鏡による元素識別」、ぶんせき、1997, 665 (1997).
[4] 辻 幸一、我妻 和明、杉山 和正、長谷川 幸雄、「元素の識別 −X線照射による元素分析型STMの試み−」, Boundary, 1999-8, 10-13
(1999).
[5] 辻 幸一, 「1st Workshop on
Environmental Analytical Artefacts」, ぶんせき, 1999, 435 (1999).
[6] 辻 幸一, 「EMAS’99 European Workshop」, 表面科学, 20, 495
(1999).
[7] 辻 幸一, 「ベルギーのマイクロアナリシス研究集団」, まてりあ, 38, 652 (1999).
[8] 辻 幸一, 「斜出射X線測定による微小領域の表面分析と微粒子分析」, まてりあ(最近の研究), 39, 586-593 (2000).
[9] 辻 幸一, 「斜出射EPMA装置の試作と分析性能の評価」, 島津科学技術振興財団平成11年度事業報告書(Annual Report of Shimadzu
Science Foundation), 19 (2000).
[10] 辻 幸一, 「斜出射X線測定型の電子線プローブマイクロアナリシス」, Ｘ線分析の進歩（アグネ技術センター）32集, 25-44 (2001).
[11] 辻 幸一, 「斜出射EPMA装置の試作と分析性能の評価」, 島津科学技術振興財団平成11年度最終報告書(Annual Report of Shimadzu
Science Foundation), 28-32 (2002).
[12] 辻 幸一、「斜出射条件下でのＥＰＭＡ」、日本学術振興会製鋼第19委員会 製鋼計測化学研究会 予稿, 19委−11935, 1-19 (2001).
[13] 辻 幸一、「斜出射X線測定とＳＴＭによる局所表面分析」、分析化学, 51,
605-612 (2002).
[14] 辻 幸一、「X線分析関連の３つの国際会議報告」、ぶんせき、2002, 533 (2002) .
[15] 辻 幸一、「斜出射X線分析のEPMAへの応用」、日本電子(株)EPMA・表面分析ユーザーズミーティング解説書、(2002) ．
[16] 辻 幸一、「斜出射X線分析−EPMAとXRFへの応用」、ぶんせき、338, 83-88 (2003)．
C.
Books (著書)
[1] 辻 幸一、広川 吉之助,「全反射現象を利用した蛍光Ｘ線表面分析法」(分担執筆), 「材料工学の先端実験技術」, pp.111-116 (日本金属学会, 1998).
[2]
“X-Ray Spectrometry Based on Recent Technological Advances”, edited by K.
Tsuji, J. Injuk, R. E. Van Grieken, John Wiley & Sons, Ltd, の編集、(2003年出版予定) 編集中.
[3] K.
Tsuji, Grazing-Exit X-Ray Spectrometry, in “X-Ray Spectrometry Based on
Recent Technological Advances”, edited by K. Tsuji, J. Injuk, R. E. Van
Grieken, John Wiley & Sons, Ltd. (2003年出版予定)．
[4] 辻 幸一、「全反射蛍光X線分析」(分担執筆)、「新訂版・表面科学の基礎と応用」（日本表面科学会編、2004年出版予定）．
[5] 辻 幸一、「蛍光X線分析」（分担執筆）、「放射光科学入門」（東北大学出版会, 2003年出版予定）.
D.
Proceedings (国際会議のプロシーディング)
[1] K.
Tsuji, S. Sato, and K. Hirokawa, X-ray
fluorescence analysis of thin films at glancing-incident and -takeoff angles, Advances in X-Ray Chemical Analysis, JAPAN,
26s, 151-156 (1995).
[2] K.
Tsuji, S. Sato, and K. Hirokawa, Nondestructive
depth profiling by glancing-incidence and -takeoff x-ray fluorescence, Mater. Trans. JIM, 37, 295-298 (1996).
[3] K.
Tsuji and K. Hirokawa, Surface analysis of Fe-Cr
alloy by glancing-incidence and -takeoff x-ray fluorescence method, Mater. Trans. JIM, 37, 1033-1036 (1996).
[4] K.
Tsuji, Z. Spolnik, K. Wagatsuma, R. Nullens, and
R. Van Grieken, Preliminary experiments on grazing-exit electron probe
microanalysis (GE-EPMA), Electron
Microscopy and Analysis 1999, proceedings of EMAG conference, 161, 119-122 (1999).
[5] K.
Tsuji, Z. Spolnik, K. Wagatsuma, R. Nullens, and
R. Van Grieken, Detection limit of grazing-exit electron probe microanalysis
(GE-EPMA) for particles analysis, Mikrochim. Acta, 132,
357-360 (2000).
[6] K. Tsuji, Z. Spolnik, K. Wagatsuma, K.
Saito, K. Asami, Characterization of thin-films at small region by grazing-exit
electron probe microanalysis, Mater. Trans. JIM. 43, 414-416, (2002).
[7] F. Delalieux, K. Tsuji, K. Wagatsuma, R. Van
Grieken, Material analysis methods applied to the study of ancient monuments,
works of art and artefacts, Mater. Trans. 43,
2197-2200 (2002).
E.
Invited talks at international conferences (国際会議での招待講演)
[1]
R. Van Grieken, J. Injuk and K. Tsuji, “TRENDS IN grazing emission X-ray ANALYSIS
TECHNIQUES”, 8th Total Reflection X-Ray Fluorescence Analysis and
Related Methods, 25-29, Sep. 2000,
[2]
K. Tsuji, Y. Hasegawa, K. Sugiyama,
K. Wagatsuma and T. Sakurai, “STM experiments under X-ray irradiation”,
Asia-Pacific Surface & International Analysis Conference, 23-26, October
2000, Beijing, China.
[3]
K. Tsuji, “Surface analysis with
PIXE in a glancing exit geometry”, 16th CAARI 2000 (Conference on
the Application of Accelerators in Research and Industry), 1-4 Nov. 2000,
Denton, Texas, USA.
[4]
K. Tsuji, “Grazing-exit X-ray
spectrometry for surface and particle analysis”, 7th Latin American
Seminary of Analysis by X-ray Techniques, 19-24, Nov. 2000, Sao Pedro, Brazil.
[5]
K. Tsuji, Z. Spolnik, “Grazing-Exit
X-ray Spectrometry for EPMA and PIXE”, International Congress on Analytical
Science (ICAS) 2001, 6-10 Aug. 2001, Waseda
University, Japan.
[6]
K. Tsuji, “Grazing-Exit X-Ray
Measurement and its Application to 3-D X-Ray Spectrometry”, Meeting at Beijing
Normal University, 15 May, 2002, Beijing, China.
[7]
K. Tsuji, “Microscopic X-Ray Surface
Analysis at Grazing-Exit Geometry”, 5th International Topical Meeting on
Industrial Radioisotope and Radiation Measurement Applications (IRRMA-V), 9 -14
June 2002, Bologna, Italy.
[8]
K.
Tsuji, “Grazing-Exit X-Ray
Spectrometry Applied to Microscopic Surface Analysis”, 9th Conference on Total
Reflection X-Ray Fluorescence Analysis and Related Methods (TXRF2002), Funchal, Madeira, Portugal, 8 - 13 September 2002.
F. Invited talks at domestic conferences (国内での招待講演)
[1] 辻 幸一、広川 吉之助、「斜入射・斜出射−蛍光Ｘ線分析法による表面近傍の分析」
東北大学金属材料研究所 ワークショップ“全反射現象を利用した各種分光法による表面・界面分析”、平成7年9月1日
[2] 辻 幸一、「斜入射・斜出射−蛍光Ｘ線分析法による表面・薄膜分析」
第15回日本表面科学会講演大会、平成7年11月29日
[3] 辻 幸一、「斜入射・斜出射Ｘ線分析法による表面分析」
第176回X線分析研究懇談会、平成7年9月19日
[4] 辻 幸一、「全反射Ｘ線励起過程の解明と微小表面分析への応用」
日本分析化学会第46年会、平成9年10月7日
[5] 辻 幸一、「斜出射条件下での電子プローブマイクロアナリシス」
日本学術振興会製鋼第19委員会 製鋼計測化学研究会、平成13年10月22日
[6] 辻 幸一、「古くて新しいＸ線分析」
日本分析化学会東北支部50周年記念講演会、平成13年12月8日
[7] F. Delalieux, 辻 幸一, 我妻和明, R. Van Grieken, ”Material
analysis of historical heritage”
日本金属学会2002年春期大会、平成14年3月28−30日
[8] 辻 幸一、「斜出射X線分析のEPMAへの応用」
2002年度日本電子EPMA・表面分析ユーザーズミーティング、平成14年9月27日
G. Presentations at international conferences (国際会議での発表)
[13] K. Tsuji, K. Wagatsuma,
R.D. Vis, R. E. Van Grieken, “Grazing-exit EPMA and grazing-exit PIXE”, European Conference on
Energy-Dispersive X-ray Spectrometry (EDXRS2000), Krakow, Poland, 18-25, June 2000 (oral)
[15] K. Tsuji, “Enhancement of TXRF intensity by using a reflector”,
International Congress on Analytical Science (ICAS) 2001, 6-10 Aug. 2001, Waseda University, Japan (poster).
[16] K. Tsuji, Y. Hasegawa, T. Sakurai, X-Ray Excitation
Combined with STM, Program of the IMR Workshop “Dr. Rohrer’s JSPS Workshop”,
5-6 March, 2002 (poster).
[17] F. Delalieux and K. Tsuji, “Feasibility Study of Three
Dimensional X-Ray Fluorescence Analysis of Japanese Art Crafts”, 7th
International Conference on Non-destructive Testing and Microanalysis for the
Diagnostics and Conservation of the Cultural and Environmental Heritage
(ART2002), 2-6 June 2002, Antwerp, Belgium (poster).
[18] Z. Spolnik, K. Tsuji, R. Van Grieken, “Grazing-Exit Electron
Probe X-Ray Micro Aanalysis of Light Elements”, European Conference on Energy
Dispersive X-Ray Spectrometry (EDXRS2002), 16-21 June 2002, Berlin, Germany
(poster)
[19] K. Tsuji, “Total Reflection X-Ray Fluorescence Analysis
using a Si Reflector”, European Conference on Energy Dispersive X-Ray
Spectrometry (EDXRS2002), 16-21 June 2002, Berlin, Germany (poster).
[20] F. Delalieux, K. Tsuji, K. Wagatsuma and S. Sato,
“Calculation of GE-EPMA Intensity and Thin-Film Analysis”, European Conference
on Energy Dispersive X-Ray Spectrometry (EDXRS2002), 16-21 June 2002, Berlin,
Germany (poster).
[21] F. Delalieux, K. Tsuji,
“Feasibility Study of Three-Demensional XRF Spectrometry Using A Pinhole
Aperture in Quasi-Contact Mode”, European Conference on Energy Dispersive X-Ray
Spectrometry (EDXRS2002), 16-21 June 2002, Berlin, Germany (poster).
[22] Z. Spolnik, K. Tsuji and R. Van
Grieken, “Grazing-exit electron probe x-ray micro
analysis of light elements in particles”, 9th Conference on Total Reflection
X-Ray Fluorescence Analysis and Related Methods (TXRF2002), Funchal,
Madeira, Portugal, 8 - 13 September 2002.
[23] K. Tsuji and F.
Delalieux, “Feasibility Study of Three-Demensional XRF Spectrometry Using A
Pinhole Aperture in Quasi-Contact Mode”, IMR (Tohoku Univ.) workshop, 11-12
November 2002, Sendai, Japan (poster).
H.
News papers (新聞記事)
[1]
科学新聞, 1997年, 11月14日「技術進歩著しい表面科学大気圧下で非破壊X線利用した新分析法研究」
[2]
日刊工業新聞, 1998年, 11月30日「STMで元素識別−X線当て光電子検出−未知の試料も特定可能に」
I. Patents (特許)
[1]
辻 幸一、斜出射電子線プローブマイクロX線分析による異物の分析法、特願2000-22205.
[2]
辻 幸一、斜出射プロトンビーム誘起特性X線分析による試料表面の観察・分析方法およびそのための装置、特願2000-45675.
[3]
辻 幸一、試料基板と反射板を用いてX線が多重反射して収束する機構にした全反射蛍光X線分析法および該分析装置、特願2002-1009．
[4]
辻 幸一、擬接触型キャピラリーを用いる微小領域X線分析方法及びその装置、特願2002-145760．